Thin film deposition is a cornerstone of magnetics research, with a number of deposition techniques readily available and easily accessible. Understanding these techniques, their uses, and their limitations is paramount when undertaking research in magnetics. Deposition via sputtering is invaluable within thin film magnetism due to its consistency, high-quality films and versatility. The ability to produce highly repeatable yet novel stacks allows for continuous movement towards new research and technologies. Sputtering provides us with the ability to create multilayer structures, alloys with composition gradients, superconducting films, and much more.

Cleanrooms are an incredible asset to our research which allow us to take our materials and create devices that may one day found in everyday technology. However, taking the step from thin film heterostructures to functional magnetic devices can often be less straightforward that we may assume. High-quality device fabrication often requires extensive cleanroom work and material choice, deposition technique choice, and desired magnetic properties can hamper our standard fabrication approach. What may seem simple on paper can become difficult and frustrating in practice.

This talk will look at the fundamentals of depositions, with an emphasis on sputtering, alongside an introduction to cleanrooms and device fabrication. Alongside this overview, there will be case studies looking at where the ‘standard’ cleanroom practices break down and how these challenges may be overcome.